/ Process Gas Analysis
 

 Process Gas Analysis

 Hiden HPR-20 Precision Gas Analysis System
Precision Gas Analysis System
HPR-20 System Design

Hiden's HPR-20 System is a compact, bench top, gas analysis system designed specifically for continuous monitoring of production processes & research experiments operating in the pressure range 10 torr to 2 bar. An “easy access” design, featuring open architecture & state-of-the-art instrumentation provides for flexibility, performance & reliability in an extensive range of applications. Operating under the control of Hiden's FASTstart differrential pumping system & Windows™ MASsoft user-friendly software, the system combines precise, analytical performance with ease of operating - making the HPR-20 ideally suited to both academic & industrial environments.
 HPR-20 High Performance Gas Analysis
The HPR-20 is designed for precision gas analysis in a wide range of production & research processes. A fast response inlet combined with intelligent trips & instant process views provide for sensitive & reliable monitoring of both reagent & low level gases.
 • High Sensitivity
 • Fast Response Inert Gas Inlet
 • Wide Dynamic Range
 • Low Sample Consumption
 • Contamination Resistant
 • Compact Bench Top System
 • Statistical Reporting
 • Comprehensive Data Exporting Facilities
 • Extensive Input/Output Process Control Options
 • High Pressure Options
 
 Hiden HPR-30 Process Gas Analysers
Gas Analysers
PR-20 System Design

The HPR-30 is a compact, bolt-on, in-situ process gas analyser designed with the versatility to operate as a mobile or fixed station monitoring system with small footprint for installation in semiconductor and thin-film processing equipment, where space is at a premium. With the integral Ethernet LAN facility up to 30 systems can be accommodated on a single network with bridges being used to connect additional instruments, making the HPR-30 ideally suited to multi-chamber monitoring and tool integration. Hiden's Windows™ MASsoft PC operating software - the platform for all instruments in the Hiden RC product range - ensures that for single and multiple systems alike ease of operation is assured, data integrity maintained and fail safe operation guaranteed.
 Triple Filter Technology
Triple Filter Technology
The HPR-30 range offers triple filter quadrupole options particulary suited to the analysis of aggressive gases in CVD and RIE. These along with our contamination resistant ioniser provide:
 
  • ppb detection levels - for low level analysis of contaminants
  • improved abundance sensitivity - for high resolution performance across the mass range
  • long term stability - for reliable performance in aggressive gas conditions
  • fast response optimal inlet design ensures faithful monitoring of process gas and contaminant level changes
  • durability - for improved MTBF
 HPR-30 Series
 Application Specific Systems for Process
 • Sputter Deposition
 • SCVD
 • SEvaporation
 • SPlasma Etch
 • SVacuum Coating
 • SPECVD
 • SVacuum Heat Treatment
 • SReactive Ion Etch
 • SLPCVD
 • SMOCVD
 • Vacuum Diagnostics
 • Leak Checking
 • Base Pressure Fingerprinting
 • Process gas Purity
 • Pump-Down Profiles
 • In-Process Contaminant Monitoring
 • Bake-out Cycle
 • Target Burn-In
 • Wafer Outgassisng
 • Virtual Leaks
 
 
 
   
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